US 2006/0065635 A1 · Deposition chamber surface enhancement and resulting deposition chambers

Abstract

Methods for passivating exposed surfaces within an apparatus for depositing thin films on a substrate are disclosed. Interior surfaces of a deposition chamber and conduits in communication therewith are passivated to prevent reactants used in a deposition process and reaction products from adsorbing or chemisorbing to the interior surfaces. The surfaces may be passivated for this purpose by surface treatments, lining, temperature regulation, or combinations thereof. A method for determining a temperature or temperature range at which to maintain a surface to minimize accumulation of reactants and reaction products is also disclosed. A deposition apparatus with passivated surfaces within the deposition chamber and gas flow paths is also disclosed.

Claims23

Dependent claims

A method of passivating surfaces in an apparatus for depositing a film of at least one material on at least one substrate, comprising:

providing an apparatus including a deposition chamber configured to receive at least one substrate therein and a plurality of conduits in communication therewith, the deposition chamber and the plurality of conduits comprising an interior surface exposed to at least one reactant gas or vapor when the deposition chamber is operative to deposit the film of the at least one material on the at least one substrate;
and
treating at least a portion of the interior surface to render the at least a portion resistant to accumulation of at least one reactant gas or vapor used in depositing the film of the at least one material on the at least one substrate.

A method for minimizing an amount of at least one reactant gas or vapor that accumulates on at least a portion of an interior surface of an apparatus for depositing a film of at least one material on at least one substrate, comprising:

measuring an amount of at least one reactant gas or vapor that physically adsorbs to a material proposed for use on the at least a portion of the interior surface at each of a plurality of temperatures over at least a portion of a temperature range;
measuring an amount of the at least one reactant or a reaction product that chemisorbs to the material proposed for use on the at least a portion of the interior surface at each of a plurality of temperatures over at least a portion of the temperature range;
and
determining if there is at least one temperature within the temperature range at which an accumulation of the at least one reactant gas or vapor on the material is minimized due to a combination of physical adsorption and chemisorption.

1 more element

Dependencies are inferred from the claim text.

Deposition chamber surface enhancement and resulting deposition chambers

Life of this patent

Deposition chamber surface enhancement and resulting deposition chambers

Life of this patent

Abstract

Claims23