Method and system for improving coupling between a surface wave plasma source and a plasma space
AssigneeTokyo Electron Limited
InventorsLee Chen, Caiz Tian, Naoki Matsumoto
Life of this patent
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Abstract
A surface wave plasma (SWP) source having an electromagnetic (EM) wave launcher configured to couple EM energy in a desired EM wave mode to a plasma by generating a surface wave on a plasma surface of the EM wave launcher adjacent the plasma. A power coupling system is coupled to the EM wave launcher, and configured to provide the EM energy to the EM wave launcher for forming the plasma. A mode scrambler coupled to the plasma surface of the EM wave launcher, and configured to reduce mode jumping between the desired EM wave mode and another EM wave mode.
Claims34
A surface wave plasma (SWP) source comprising:
- an electromagnetic (EM) wave launcher configured to couple EM energy in a desired EM wave mode to a plasma by generating a surface wave on a plasma surface of the EM wave launcher adjacent said plasma;
- a power coupling system coupled to said EM wave launcher, and configured to provide said EM energy to said EM wave launcher for forming said plasma;
- and
- a mode scrambler coupled to said plasma surface of said EM wave launcher, and configured to reduce mode jumping between said desired EM wave mode and another EM wave mode.
A surface wave plasma (SWP) source comprising:
- an electromagnetic (EM) wave launcher configured to couple EM energy in a desired EM wave mode to a plasma by generating a surface wave on a plasma surface of the EM wave launcher adjacent said plasma;
- a power coupling system coupled to said EM wave launcher, and configured to provide said EM energy to said EM wave launcher for forming said plasma;
- and
- means for reducing mode jumping between said desired EM wave mode and another EM wave mode.
A method of manufacturing a surface wave plasma (SWP) source, comprising:
- providing an electromagnetic (EM) wave launcher configured to couple EM energy in a desired EM wave mode to a plasma by generating a surface wave on a plasma surface of the EM wave launcher adjacent said plasma;
- providing a coupling structure configured to couple said EM energy to said EM wave launcher for forming said plasma;
- and
- forming a mode scrambler on said plasma surface of said EM wave launcher, said mode scrambler being configured to reduce mode jumping between said desired EM wave mode and another EM wave mode.
A surface wave plasma (SWP) source comprising:
- an electromagnetic (EM) wave launcher configured to couple EM energy in a desired EM wave mode to a plasma by generating a surface wave on a plasma surface of the EM wave launcher adjacent said plasma;
- and
- a power coupling system coupled to said EM wave launcher, and configured to provide said EM energy to said EM wave launcher for forming said plasma, wherein
- said EM wave launcher comprises a resonator plate containing said plasma surface on which said surface wave is generated, and
- said resonator plate comprises a high dielectric constant material.
Dependencies are inferred from the claim text.