Method of fabricating oxide film
AssigneeSamsung Electronics Co., Ltd.
InventorsSe-ahn Song, Alexander Latyshev, Anton Gutakovskii, Dmitry Sheglov, Ludmila Fedina
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Abstract
Provided is a method of fabricating an oxide film on a substrate. The method includes: (a) placing an electrode adjacent to a first region of the substrate on which the oxide film is to be formed under a humid atmosphere; (b) contacting the electrode with the substrate while applying voltage between the electrode and the substrate; and (c) applying pressure to the electrode while applying voltage between the electrode and the substrate and forming the oxide film on the surface of the substrate due to anodic oxidation. Accordingly, the oxide film fabrication method may be used to fabricate an electronic device with a nanometer scale.
Claims19
A method of fabricating an oxide film on a surface of a substrate, the method comprising:
- (a) placing an electrode adjacent to a first region of the substrate on which the oxide film is to be formed under a humid atmosphere;
- (b) contacting the electrode with the substrate while applying voltage between the electrode and the substrate;
- and
- (c) applying pressure to the electrode while applying voltage between the electrode and the substrate and forming the oxide film on the surface of the substrate due to anodic oxidation.
Dependencies are inferred from the claim text.