Method for manufacturing magnetron coated substrates and magnetron sputter source
AssigneeOerlikon Advanced Technologies AG
InventorJurgen Weichart
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Abstract
Method for manufacturing magnetron coated substrates, in which along the target and on its backside pointing from the substrate, a magnet arrangement is present by which along the sputter surface of the target at least one closed loop of a tunnel shaped magnetron magnetic field is generated, characterized in that for setting the sputter rate distribution the distance of a part of the magnet arrangement to the backside of the target is changed.
Claims21
Method for manufacturing magnetron coated substrates, in which along the target and on its backside pointing from the substrate, a magnet arrangement is present by which along the sputter surface of the target at least one closed loop of a tunnel shaped magnetron magnetic field is generated, characterized in that for setting the sputter rate distribution the distance of a part of the magnet arrangement to the backside of the target is changed.
Magnetron source with a target with sputter surface, along the backside of the target opposite the sputter surface, a magnet arrangement, characterized in that the distance to the backside of the target of a part of the magnet arrangement is adjustable by means of a controlled lift drive.
Dependencies are inferred from the claim text.