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OwnerFangli Hao, John Daugherty +1inventors
InventorsFangli Hao, John Daugherty, James Tappan
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In a plasma processing system, an integrated gas flow control assembly for connecting a gas distribution system to a multi-zone injector is disclosed. The assembly includes a first set of channels connecting the gas distribution system to a first valve assembly with a first flow rate, a second valve assembly with a second flow rate, a third flow assembly with a third flow rate, and a fourth flow assembly with a fourth flow rate, wherein when the first valve assembly is substantially open, the third flow rate is less than the first flow rate, and wherein when the second valve assembly is substantially open, the fourth flow rate is less than the second flow rate. The assembly also includes a second set of channels for connecting the third flow assembly and the first valve assembly to a first multi-zone injector zone. The assembly further includes a third set of channels for connecting the fourth flow assembly and the second valve assembly to a second multi-zone injector zone. Wherein if the first valve assembly is closed, a first multi-zone injector zone flow rate is about the third flow rate, and wherein if the second valve assembly is closed, a second multi-zone injector zone flow rate is about the fourth flow rate.
In a plasma processing system, an integrated gas flow control assembly for connecting a gas distribution system to a multi-zone injector, comprising:
The integrated gas flow control assembly of 1, wherein said first valve assembly and said second valve assembly each comprise a variable flow valve assembly.
The integrated gas flow control assembly of 1, wherein said first valve assembly and said second valve assembly each comprise a non-variable flow valve assembly
The integrated gas flow control assembly of 1, wherein said first valve assembly and said second valve assembly are located in a first sub-assembly of said integrated gas flow control assembly, and wherein said third flow assembly and said fourth flow assembly are substantially located in a second sub-assembly of said integrated gas flow control assembly.
The integrated gas flow control assembly of 1, wherein said integrated gas flow control assembly comprises ceramic.
The integrated gas flow control assembly of 1, wherein said integrated gas flow control assembly comprises plastic.
The integrated gas flow control assembly of 1, wherein said integrated gas flow control assembly comprises Dupont Vespel.
The integrated gas flow control assembly of 1, wherein said integrated gas flow control assembly comprises Hastelloy.
The integrated gas flow control assembly of 1, wherein said integrated gas flow control assembly comprises stainless steel.
The integrated gas flow control assembly of 1, wherein said integrated gas flow control assembly is located in a lower chamber of a plasma processing system.
The integrated gas flow control assembly of 1, wherein said integrated gas flow control assembly is substantially transparent to a RF field.
The integrated gas flow control assembly of 1, wherein said plasma processing system is a capactively coupled plasma processing system.
The integrated gas flow control assembly of 1, wherein said plasma processing system is an inductively coupled plasma processing system.
The integrated gas flow control assembly of 1, wherein said plasma processing system is an atmospheric plasma processing system.
In a plasma processing system, a plastic integrated gas flow control assembly that is substantially transparent to a RF field, for connecting a gas distribution system to a multi-zone injector, comprising:
Dependencies are inferred from the claim text.