Devices containing zirconium-platinum-containing materials and methods for preparing such materials and devices
AssigneeMicron Technology, Inc.
InventorEugene Marsh
Life of this patent
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Abstract
Methods for forming materials containing both zirconium and platinum, such as platinum-zirconium films, and articles containing such materials. The resultant films can be used as electrodes in an integrated circuit structure, particularly in a memory device such as a ferroelectric memory device. The platinum-zirconium materials can also be used in catalyst materials.
Claims11
1-37. (canceled)
A method of manufacturing a catalyst, the method comprising:
- providing a substrate;
- providing a precursor composition comprising one or more zirconium complexes;
- providing a precursor composition comprising one or more platinum complexes;
- and
- forming a platinum-zirconium-containing material from the precursor compositions on a surface of the substrate to form a catalyst.
A catalyst comprising a platinum-zirconium-containing material.
A method of stabilizing a platinum film upon annealing the film at a temperature of at least about 650° C., the method comprising incorporating zirconium into the platinum film.
Dependencies are inferred from the claim text.