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AssigneesShoji Miyake, Akinori Ebe, Japan Science and Technology Agency
InventorsShoji Miyake, Akinori Ebe, Tatsuo Shoji, Yuichi Setsuhara
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The present invention aims to provide a plasma generator capable of creating a spatially uniform distribution of high-density plasma. This object is achieved by the following construction. Multiple antennas 16 are located on the sidewall of a vacuum chamber 11, and a RF power source is connected to three or four antennas 16 in parallel via a plate-shaped conductor 19. The length of the conductor of each antenna 16 is shorter than the quarter wavelength of the induction electromagnetic wave generated within the vacuum chamber. Setting the length of the conductor of the antenna in such a manner prevents the occurrence of a standing wave and thereby maintains the uniformity of the plasma within the vacuum chamber. In addition, the plate-shaped conductor 19 improves the heat-releasing efficiency, which also contributes to the suppression of the impedance.
A plasma generator, comprising:
A plasma control method using a plasma generator having multiple RF antennas located within a vacuum chamber, said antennas being arranged on one or both of a sidewall and a ceiling wall of the vacuum chamber and roughly parallel to a stage on which a base plate is to be placed, wherein a state of plasma generated within the vacuum chamber is controlled by regulating a RF power supplied to each antenna.
Dependencies are inferred from the claim text.