Substrate holder for a vapour deposition system
AssigneeJDS Uniphase Corporation
InventorRichard Seddon
Life of this patent
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Abstract
The invention relates to a partially disposable substrate holder used in magnetic latches for securing substrates on a planetary rotating platform suspended above a coating source in a vacuum chamber of a vapor deposition system, e.g. a chemical vapor deposition (CVD) system or a physical vapor deposition (PVD) system. The substrate holder includes a reusable base formed, at least partially, from a ferro-magnetic material, which is attracted to the magnetic latch, and a disposable cover formed from a relatively inexpensive, ferromagnetic, easily formable material, which encourages adherence of coating material and has a low vapor pressure at coating temperatures.
Claims20
A substrate support for mounting in a process chamber of a coating system, comprising:
- at least one spindle rotatable about respective spindle axes;
- a latch on an end of each spindle including a mounting surface;
- and
- a releasable substrate holder for mounting on the mounting surface of said latch, said substrate holder including a base and a cover mounted on an end face of the base for supporting a substrate;
- wherein the cover includes an opening to expose the substrate, a lip surrounding the opening for holding an edge of the substrate against the base, and a protective region covering the end face of the base for protecting the base from stray coating material;
- wherein the cover is made of a sheet metal;
- and
- wherein the cover is releasably attached to said base for removal therefrom.
Dependencies are inferred from the claim text.