Apparatus and method for two dimensional magnetron scanning for sputtering onto flat panels
AssigneeApplied Materials, Inc.
InventorAvi Tepman
Life of this patent
Estimating the term…
Loading patent…
AssigneeApplied Materials, Inc.
InventorAvi Tepman
Estimating the term…
A rectangular magnetron placed at the back of a rectangular target to intensify the plasma in a sputter reactor configured for sputtering target material onto a rectangular panel. The magnetron has a size only somewhat less than that of the target and is scanned in the two perpendicular directions of the target with a scan length of, for example, about 100 mm for a 2 m target. The scan may follow a double-Z pattern along two links parallel to a target side and the two connecting diagonals. The magnetron includes a closed plasma loop formed in a convolute shape, for example, a rectangularized helix with an inner pole of nearly constant width extending along a single path and having one magnetic polarity completely surrounded by an outer pole having the opposed polarity. External actuators move the magnetron slidably suspended from a gantry which sliding perpendicularly on the chamber walls.
In a plasma sputter reactor which having a chamber and is fittable with a rectangular target for sputtering depositing material of the target onto a rectangular substrate and a magnetron formed in a magnetron plate disposable on a back of the target opposite the substrate, a scan mechanism comprising:
In a plasma sputter reactor which having a chamber and is fittable with a rectangular target for sputtering depositing material of the target onto a rectangular substrate and a magnetron formed in a magnetron plate disposable on a back of the target opposite the substrate, a scan mechanism comprising:
A method of sputtering onto a rectangular substrate, comprising the step of scanning a magnetron in back of a sputtering target along a first two-dimensional multi-part path having at least straight portion.
A method of sputtering onto a rectangular substrate, comprising the step of scanning a magnetron in back of a substantially rectangular sputtering target along a path having straight portions non-parallel to each other.
Dependencies are inferred from the claim text.