Apparatus for processing substrates

A processing apparatus for substrates, comprising:

• a mounting table for mounting substrates before curing, the substrates consisting of a pair of individual substrates having a photo-curable adhesive layer interposed therebetween;
• an irradiating device that irradiates the substrates before curing with a curing light while the substrates before curing are mounted on the mounting table;
• and
• a control device for controlling a deflection of the substrates X after curing by carrying out temperature control of at least one of the substrates before curing and the mounting table while the individual substrates are bonded together by photo-curing the adhesive;
• the control device comprises:
• a device that finds a temperature Th of the mounting table;
• a device that finds a deflection difference ΔX by calculating a target deflection setting value Xt and the deflection X;
• a device that finds a temperature Tc by calculating Tc=Th−M×ΔX by using a constant of proportionality M determined by a correlation between at least two combinations of the temperature Th of the mounting table and the deflection X;
• and
• a device that carries out temperature control of the mounting table according to the temperature Tc.

A processing apparatus for substrates, comprising:

• a mounting table for mounting substrates before curing, the substrates consisting of a pair of individual substrates having a photo-curable adhesive layer interposed therebetween;
• an irradiating device that irradiates the substrates before curing with a curing light while the substrates before curing are mounted on the mounting table;
• and
• a control device for controlling a deflection X of the substrates after curing by carrying out temperature control of at least one of the substrates before curing and the mounting table when the individual substrates are bonded together by photo-curing the adhesive;
• the control device comprises:
• a device that finds a temperature Td of the substrates before curing;
• a device that finds a deflection difference ΔX by calculating a target deflection setting value Xt and the deflection X;
• a device that finds a temperature Tc by calculating Tc=Td+M×ΔX by using a constant of proportionality M determined by a correlation between at least two combinations of the temperature Td of the substrates before curing and the deflection X;
• and
• a device that carries out temperature control of the substrates before curing according to the temperature Tc.

A processing apparatus for substrates, comprising:

• a mounting table for mounting substrates before curing, the substrates consisting of a pair of individual substrates having a photo-curable adhesive layer interposed therebetween;
• an irradiating device that irradiates the substrates before curing with a curing light while the substrates before curing are mounted on the mounting table;
• and
• a control device for controlling a deflection X of the substrates after curing by carrying out temperature control of at least one of the substrates before curing and the mounting table while the individual substrates are bonded together by photo-curing the adhesive;
• the control device comprises:
• a device that finds the relationship (Th−Td=M×X+a), where a constant of proportionality determined by a correlation of at least two combinations of a temperature difference ΔT between a temperature Th of the mounting table and a temperature Td of the substrates before curing and the deflection X is denoted M, a temperature difference ΔT between the temperature Th of the mounting table and the temperature Td of the substrates before curing when the deflection X of the substrates after curing is zero is denoted a;
• and
• a device that carries out a temperature control of at least one of the substrates after curing and the mounting table such that Th−Td=M×Xt+a, where a deflection setting value is denoted Xt.