Methods of cleaning optical substrates
AssigneeHoneywell International Inc.
InventorsMichael McCoy, Jerry Blumhoefer, Bruce Seiber
Life of this patent
Estimating the term…
Abstract
Described are methods for processing optical materials, by use of cleaning materials that include acid and oxidizer.
Claims33
A method of removing non-photosensitive polymeric organic material from an optical substrate surface, the method comprising contacting the non-photosensitive polymeric organic material and the optical substrate surface with a cleaning material comprising oxidizer and acid.
(canceled)
(canceled)
A method of removing organic adhesive from an optical substrate, the method comprising
- providing an optical substrate having organic adhesive material on a surface,
- providing an oxidizer,
- providing an acid,
- combining the oxidizer and acid to provide a cleaning material, and
- immersing the optical substrate in the cleaning material.
23-25. (canceled)
A method of removing non-photosensitive polymeric organic material from an optical substrate, the method comprising contacting the optical substrate with a cleaning material comprising oxidizer and acid, wherein the organic material comprises a residue from an adhesive and the adhesive is blocking wax.
Dependencies are inferred from the claim text.