Tool for cleaning particles from wafer stage

Abstract

The present invention discloses a tool for cleaning particles from a wafer stage, comprising: a main body, a driving device, a power supply, and a cleaning module composed of a rotary base, a turntable, and an elastic member, wherein the main body is designed to be extendable, having a accommodating space disposed at the front thereof, and the driving device is arranged in the accommodating space for driving the cleaning module, and the power supply is coupled to the driving device for providing power to the same. Moreover, the rotary base is connected to the turntable by way of the elastic member, so that the driving device can drive the turntable to rotate for cleaning the wafer stage. A plurality turntables of different characteristic can be selected to be used in the cleaning module of the invention with respect to different cleaning requirement and environment.

Dependencies are inferred from the claim text.