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US 2006/0040839 A1Published application
Cleaning composition and method
AssigneeTosoh Corporation
InventorsYasushi Hara, Fumiharu Takahashi, Hiroaki Hayashi, Akinori Shimono
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Abstract
Cleaning compositions composed of specific amounts of carbonic acid and/or carbonate, hydrogen peroxide, aluminum fluoride and water are highly effective for cleaning electronic devices of resist, resist residues, titanium dioxide, aluminum oxide and silicon dioxide. The compositions contain no hydroxylamine and are thus free of its hazards.
Claims10
A cleaning composition comprising:
- (a) carbonic acid, a carbonate, or a combination of both,
- (b) hydrogen peroxide,
- (c) aluminum fluoride, and
- (d) water.
1 more element
Dependencies are inferred from the claim text.