Method of fabricating silicon carbide-capped copper damascene interconnect
OwnerJei-Ming Chen, Chin-Hsiang Lin +2inventors
InventorsJei-Ming Chen, Chin-Hsiang Lin, Chih-Chien Liu, Kuo-Chih Lai
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Abstract
A dielectric layer overlying a substrate is prepared. A damascene opening is etched into the dielectric layer. The damascene opening is filled with copper or copper alloy. A surface of the copper or copper alloy is treated with hydrogen-containing plasma such as H2 or NH3 plasma. The treated surface of the copper or copper alloy then reacts with trimethylsilane or tertramethylsilane under plasma enhanced chemical vapor deposition (PECVD) conditions. Subsequently, by PECVD, a silicon carbide layer is in-situ deposited on the copper or copper alloy.
Claims8
A copper damascene process, comprising:
- forming a dielectric layer overlying a substrate;
- etching a damascene opening into said dielectric layer;
- filling said damascene opening with copper or copper alloy;
- treating a surface of said copper or copper alloy with hydrogen-containing plasma;
- reacting said treated surface of said copper or copper alloy with trimethylsilane or tertramethylsilane under plasma enhanced chemical vapor deposition (PECVD) conditions;
- and
- in-situ depositing, by PECVD, a silicon carbide layer capping on said copper or copper alloy.
A copper damascene process, comprising:
- forming a dielectric layer overlying a substrate;
- etching a damascene opening into said dielectric layer;
- filling said damascene opening with copper or copper alloy;
- treating a surface of said copper or copper alloy with hydrogen-containing plasma;
- reacting said treated surface of said copper or copper alloy with trimethylsilane or tertramethylsilane under plasma enhanced chemical vapor deposition (PECVD) conditions;
- and
- in-situ depositing, by PECVD, a silicon carbide layer capping on said copper or copper alloy, said silicon carbide layer being treated with in-situ ammonia plasma to remove contained oxygen of the deposited layer.
Dependencies are inferred from the claim text.