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US 2006/0040478 A1Published application
Method of producing a calibration wafer
AssigneeMattson Thermal Products GmbH
InventorsChristoph Merkl, Markus Hauf, Rolf Bremensdorfer
Life of this patent
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Abstract
A method of producing a calibration wafer having at least a predetermined emissivity, including providing a wafer of semiconductor material; subjecting the bulk material of the wafer to doping with foreign atoms and/or generating lattice defects to obtain the predetermined emissivity; and coating the wafer to obtain a further optical characteristic.
Claims15
1-12. (canceled)
A method of producing a calibration wafer having at least a predetermined emissivity, including the steps of
- providing a wafer of semiconductor material;
- subjecting the bulk material of the wafer to at least one of doping with foreign atoms and generating lattice defects to adjust the predetermined emissivity;
- coating the wafer to obtain a further optical characteristic.
Dependencies are inferred from the claim text.