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AssigneeASML Netherlands B.V.
InventorsKars Troost, Johannes Jacobus Baselmans, Karel Van Der Mast
Estimating the term…
Grayscale Optical Proximity Correction device features are added to a mask pattern by convoluting the device features with a two-dimensional correction kernel or two one-dimensional correction kernels to generate grayscale OPC features. The resulting pattern may be used in a projection lithography apparatus having a programmable patterning means that is adapted to generate three or more intensity levels. An iterative process of simulating an aerial image that would be produced by the pattern, comparing the simulation to the desired pattern, and adjusting the OPC features may be used to generate an optimum pattern for projection
A method of generating a mask pattern, comprising:
A device manufacturing method, comprising:
A computer program product comprising a computer useable medium having a computer program logic recorded thereon for controlling at least one processor, the computer program logic comprising:
A lithographic apparatus, comprising:
In a projection lithography apparatus having a patterning array of individually controllable elements settable to three or more states that modulates a beam and a projection system that projects the modulated beam onto a substrate to print a pattern thereon defined by the modulation effected by the patterning array of individually controllable elements, a pattern corrector receives a two level device pattern and convolutes the device pattern with a correction kernel to generate correction features having intensity levels of at least one level between the levels of the device pattern.
Dependencies are inferred from the claim text.