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US 2006/0038296 A1Published application
Integrated low-k hard mask
AssigneeIntel Corporation
InventorsSean King, Andrew Ott
Life of this patent
Estimating the term…
Abstract
Embodiments of the invention provide a device with a hard mask layer between first and second ILD layers. The hard mask layer may have a k value approximately equal to the first and/or second ILD layers.
Claims17
-9. (canceled)
A device, comprising:
- a first interlayer dielectric layer with a top surface and having a low dielectric constant;
- a first conductive trace extending at least partially into the first interlayer dielectric layer, and having a top surface above the top surface of the first interlayer dielectric layer;
- a first hard mask layer having a low dielectric constant with a top surface substantially flush with the top surface of the first conductive trace;
- a second interlayer dielectric layer on the first conductive trace and first hard mask layer, and having a top surface;
- a conductive cap layer on the first conductive trace, between the first conductive trace and the second interlayer dielectric layer;
- a second conductive trace extending at least partially into the second interlayer dielectric layer, and having a top surface above the top surface of the second interlayer dielectric layer;
- and
- a second hard mask layer with a top surface substantially flush with the top surface of the second conductive trace.
5 more elements
A device, comprising:
- a first interlayer dielectric layer with a top surface;
- a first hard mask layer on the first interlayer dielectric layer having a bottom surface adjacent the top surface of the first interlayer dielectric layer, the first hard mask layer being substantially free of hydrogen;
- a first conductive trace at least partially surrounded by the first interlayer dielectric layer;
- and
- wherein each of the first hard mask layer and the first interlayer dielectric layer has a dielectric constant value of less than about 3.2.
2 more elements
Dependencies are inferred from the claim text.