Antiferromagnetic/paramagnetic resistive device, non-volatile memory and method for fabricating the same
AssigneeSamsung Electronics Co., Ltd.
InventorsJung-hyun Lee, Young-soo Park
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AssigneeSamsung Electronics Co., Ltd.
InventorsJung-hyun Lee, Young-soo Park
Estimating the term…
A resistive multilayer device employs a first layer comprising a first material that is electrically conducting, a second layer disposed on the first layer, wherein the second layer comprises a second material having a state that is switchable between an antiferromagnetic state and a paramagnetic state by passing current through the second material, a third layer disposed on the second layer, wherein the third layer comprises a third material that is electrically conducting and a fourth dielectric layer. The second layer has a resistance in the antiferromagnetic state that is different from its resistance in the paramagnetic state, and the state of the second material is retained in an absence of applied power. The resistive multilayer device can be formed as part of a memory cell of a non-volatile memory, wherein information is stored in the memory cell based upon the state of the second material.
A non-volatile memory device, comprising:
A resistive multilayer device, comprising:
A resistive multilayer device, comprising:
A method of fabricating a resistive multilayer device, comprising:
Dependencies are inferred from the claim text.