Thin film transistor array panel and a manufacturing method thereof

A method of manufacturing a thin film transistor array panel, the method comprising:

• forming a gate line and a storage electrode line on a substrate;
• forming a gate insulating layer on the gate line and the storage electrode line;
• forming a semiconductor layer on the gate insulating layer;
• forming an ohmic contact layer on the semiconductor layer;
• forming a data line and a drain electrode on the ohmic contact layer;
• depositing a passivation layer on the data line and the drain electrode;
• forming a first photoresist including a first portion and a second portion on the passivation layer;
• etching the passivation layer using the first photoresist to expose a portion of the data line and a first portion of the gate insulating layer;
• removing the second portion of the first photoresist to transform the photo resist;
• etching the passivation layer and the first portion of the gate insulating layer using the first transformed photoresist to expose a second portion of the gate insulating layer, a portion of the drain electrode and a portion of the gate line;
• depositing a conductive film on the first transformed photoresist;
• and
• removing the first transformed photoresist to form a pixel electrode connected to the exposed portion of the drain electrode.