MRAM over sloped pillar
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsChi-Wen Liu, Kuo-Ching Chiang, Horng-Huei Tseng, Denny Tang
Life of this patent
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Abstract
An apparatus including a pillar located over a substrate and having at least one sloped surface oriented at an acute angle relative to the substrate. The apparatus also includes an MRAM stack substantially conforming to the sloped surface, the MRAM stack thereby also oriented at the acute angle relative to the substrate. The MRAM stack may comprise a plurality of substantially planar, parallel layers each oriented at an acute angle relative to the substrate.
Claims42
An apparatus, comprising:
- a pillar located over a substrate and having at least one sloped surface oriented at an acute angle relative to the substrate;
- and
- an MRAM stack substantially conforming to the sloped surface, the MRAM stack thereby also oriented at the acute angle relative to the substrate.
An apparatus, comprising:
- an MRAM stack located over a substrate and comprising a plurality of substantially planar, parallel layers each oriented at an acute angle relative to the substrate.
An apparatus, comprising:
- first and second substantially coplanar pillars located over a substrate and laterally opposing an MRAM stack having a plurality of layers, wherein at least one of the plurality of MRAM stack layers substantially conforms to a surface of one of the first and second pillars that is oriented at an acute angle relative to the substrate.
An apparatus, comprising:
- a first pillar located over a substrate and having a first surface oriented at a first acute angle relative to the substrate;
- a second pillar located over the substrate and having a second surface oriented at a second acute angle relative to the substrate;
- a first MRAM stack interposing the first and second pillars and including a first plurality of layers, wherein at least one of the first plurality of layers substantially conforms to the first surface of the first pillar;
- and
- a second MRAM stack interposing the first MRAM stack and the second pillar and including a second plurality of layers, wherein at least one of the second plurality of layers substantially conforms to the second surface of the second pillar.
A method, comprising:
- forming a pillar over a substrate, the pillar having a sloped surface oriented at an acute angle relative to the substrate;
- and
- forming an MRAM stack having a plurality of layers, wherein at least one of the plurality of layers substantially conforms to the pillar surface oriented at an acute angle relative to the substrate.
Dependencies are inferred from the claim text.