Surface position detection apparatus and method, and exposure apparatus and device manufacturing method using the exposure apparatus

An exposure apparatus for exposing a substrate moving in a scan direction to light directed via an original, said apparatus comprising:

• a projection optical system configured to image a pattern of the original on the substrate;
• a substrate stage configured to hold the substrate and to move;
• a detector configured to detect a surface position of the substrate, held and moved in the scan direction at a scan speed by said substrate stage, in a direction parallel to an optical axis of said projection optical system over a detection region preset on the substrate;
• and
• a controller configured to preset the detection region, to change a detection time over which said detector detects a surface position of the substrate based on a change in the scan speed of said substrate stage so that said detector detects a surface position of the substrate over the preset detection region, and to control at least one of a position and a tilt of said substrate stage with respect to the direction parallel to the optical axis based on a detection obtained by said detector.

An exposure method of exposing a substrate moving in a scan direction to light directed via an original, said method comprising steps of:

• presetting a detection region on the substrate;
• detecting, using a detector, a surface position of the substrate, held and moved in the scan direction at a scan speed by a substrate stage, in a direction parallel to an optical axis of a projection optical system, configured to image a pattern of the original on the substrate, over the preset detection region;
• and
• changing a detection time over which the detector detects a surface position of the substrate based on a change in the scan speed of the substrate stage so that the detector detects a surface position of the substrate over the preset detection region;
• and
• at least one of positioning and tilting the substrate stage with respect to the direction parallel to the optical axis based on a detection obtained by the detector.