Method of generation of charged particle beam exposure data and charged particle beam exposure method using a block mask
AssigneeFujitsu Limited
InventorsTakashi Maruyama, Manabu Ohno
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AssigneeFujitsu Limited
InventorsTakashi Maruyama, Manabu Ohno
Estimating the term…
A method of generation of exposure data for charged particle beam exposure using a block mask, in which a first transmission beam is formed by transmission of a charged particle beam through a rectangular first transmission aperture; a second transmission beam is formed by causing the first transmission beam to be transmitted through a block mask having a plurality of discrete patterns; and the second transmission beam irradiates an object for exposure. This exposure data generation method has a step of generating irradiation position data of the first transmission beam on the block mask, such that the Y-direction or X-direction edge of the first transmission beam is positioned in a common isolated area in the X direction or Y direction of the plurality of discrete patterns in the block mask.
An exposure data generation method for charged particle beam exposure, in which a charged particle beam is passed through a rectangular first transmission aperture to form a first transmission beam, the first transmission beam is passed through a block mask having a plurality of discrete patterns to form a second transmission beam, and the second transmission beam irradiates an object for exposure, comprising:
A charged particle beam exposure method, in which a charged particle beam is passed through a rectangular first transmission aperture to form a first transmission beam, the first transmission beam is passed through a block mask having a plurality of discrete patterns to form a second transmission beam, and the second transmission beam irradiates an object for exposure, comprising the steps of:
Dependencies are inferred from the claim text.