Electron microscope array for inspection and lithography

A system comprising at least one column having an axis, the at least one column including:

• (i) at least one source of charged particles which form a charged particle beam which moves through the at least one column in a direction substantially parallel to the axis;
• and
• (ii) a plurality of multi-pole charged particle beam deflecting elements which form at least two stages of a multi-pole charged particle beam deflecting assembly;
• wherein said charged particle beam is deflected serially by said at least two stages, so that said charged particle beam is incident on a specimen in a direction substantially parallel to the axis.

A method for rapidly processing a specimen, the method comprising the steps of:

• (a) generating a plurality of charged-particle beams travelling substantially along respective axes of an array of charged-particle beam columns, by providing each beam column with at least two permanent magnets having at least one magnetic dipole disposed in a plane substantially perpendicular to the axis;
• (b) independently controlling trajectory and focussing said beams onto the specimen;
• and
• (c) deflecting said beams while maintaining incidence of said beam on the specimen substantially parallel to the axis.

A method for detecting charged particles, the method comprising the steps of:

• (a) providing a plurality of electrodes wherein said electrodes include a material which exhibits emission of secondary electrons;
• (b) immersing said electrodes at least in part by a magnetic field;
• and
• (c) maximizing performance of said detecting so that at least one trajectory of said secondary electrons impinge on said electrodes by utilizing said magnetic field.