Bulk single crystal gallium nitride and method of making same
AssigneeCree, Inc.
InventorsMichael Tischler, Thomas Kuech, Robert Vaudo
Life of this patent
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AssigneeCree, Inc.
InventorsMichael Tischler, Thomas Kuech, Robert Vaudo
Estimating the term…
A single crystal M*N article, which may be made by a process including the steps of: providing a substrate of material having a crystalline surface which is epitaxially compatible with M*N; depositing a layer of single crystal M*N over the surface of the substrate; and removing the substrate from the layer of single crystal M*N, e.g., with an etching agent which is applied to the substrate to remove same, to yield the layer of single crystal M*N as said single crystal M*N article. The bulk single crystal M*N article is suitable for use as a substrate for the fabrication of microelectronic structures thereon, to produce microelectronic devices comprising bulk single crystal M*N substrates, or precursor structures thereof.
A method of making a free-standing III-V nitride single crystal article, comprising:
Dependencies are inferred from the claim text.