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OwnerMichael Van Der Puy, Jingji Ma +6inventors
InventorsMichael Van Der Puy, Jingji Ma, Dennis Lavery, Lawrence Ford, Haridasan Nair, David Nalewajek, Andrew Poss, Leonard Stachura
Estimating the term…
Monomers and polymers useful for forming photoresists. More particularly, photoresists, as well as monomers and polymers for photoresists useful in micro-lithography, specifically monomers bearing acid-labile groups of reduced optical density. The resulting photoresists exhibit improved transparency to 157 nm light. The photoresist compositions are composed of a mixture of at least one water insoluble, acid decomposable polymer which is prepared from at least one monomer having a monomeric unit structure which comprises: where Hal=F, Cl or Br and X=H or F; and which is substantially transparent to ultraviolet radiation at a wavelength of about 157 nm, and at least one photoacid generator capable of generating an acid upon exposure to sufficient activating energy at a wavelength of about 157 nm.
A compound having the structure:
A polymer which comprises a homopolymer or copolymer which is derived from at least one member which member comprises a compound having the structure:
A photoresist composition comprising:
A process for producing an etch resistant image which comprises:
A microelectronic device image produced by a process which comprises:
Dependencies are inferred from the claim text.