Tantalum sputtering target and method of manufacture
OwnerHarry Rosenberg, Bahri Ozturk +2inventors
InventorsHarry Rosenberg, Bahri Ozturk, Guangxin Wang, Wesley LaRue
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Abstract
Described is a method for producing high purity tantalum, the high purity tantalum so produced and sputtering targets of high purity tantalum. The method involves purifying starting materials followed by subsequent refining into high purity tantalum.
Claims16
1-30. (canceled)
A high purity tantalum powder comprising greater than or equal to 99.95 weight percent (wt %) tantalum on a total metals basis, less than 500 parts per million by weight (ppmw) total metallic impurities, less than 50 ppmw tungsten or molybdenum, and less than 10 ppmw niobium.
A sputtering target blank comprising greater than or equal to 99.95 weight percent (wt %) tantalum on a total metals basis, less than 500 parts per million by weight (ppmw) total metallic impurities, and less than 5 ppmw total of tungsten, molybdenum, and niobium.
Dependencies are inferred from the claim text.