Photoresists, fluoropolymers and processes for 157 nm microlithography
AssigneeE.I. du Pont de Nemours and Company
InventorsAndrew Feiring, Frank Schadt, Viacheslav Petrov, Bruce Smart, William Farnham
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Abstract
The invention provides a polymer having (a) at least one repeat unit derived from an ethylenically unsaturated compound having at least one fluorine atom covalently attached to an ethylenically unsaturated carbon atom; and (b) at least one repeat unit derived from an ethylenically unsaturated cyclic compound of structure: (I) wherein n is 0, 1, or 2; and R2 to R4 are independently H; C1-C10 alkyl or alkoxy, optionally substituted by halogen or ether oxygens; or C6-C20 aryl. These polymers can be used in making photoresist compositions and coated substrates.
Claims36
A fluorine-containing copolymer comprising:
- (a) at least one repeat unit derived from an ethylenically unsaturated compound having at least one fluorine atom covalently attached to an ethylenically unsaturated carbon atom;
- and
- (b) at least one repeat unit derived from an ethylenically unsaturated cyclic compound of structure (I):
- wherein n is 0, 1, or 2;
- and
- R1 to R4 are independently H;
- C1-C10 alkyl or alkoxy, optionally substituted by halogen or ether oxygens;
- or C6-C20 aryl.
A photoresist composition comprising:
- (a) a fluorine-containing copolymer comprising:
- (i) at least one repeat unit derived from an ethylenically unsaturated compound having at least one fluorine atom covalently attached to an ethylenically unsaturated carbon atom;
- and
- (ii) at least one repeat unit derived from an ethylenically unsaturated cyclic compound of structure:
- wherein n is 0, 1, or 2;
- and
- R1 to R4 are independently H;
- C1-C10 alkyl or alkoxy, optionally substituted by halogen or ether oxygens;
- or C6-C20 aryl;
- and
- (b) a photoactive component
A coated substrate comprising:
- (a) a substrate;
- and
- (b) a photoresist composition comprising a fluorine-containing copolymer comprising:
- (i) a fluorine-containing copolymer comprising:
- (a′) at least one repeat unit derived from an ethylenically unsaturated compound having at least one fluorine atom covalently attached to an ethylenically unsaturated carbon atom;
- and
- (b′) at least one repeat unit derived from an ethylenically unsaturated cyclic compound of structure:
- wherein n is 0, 1, or 2;
- and
- R1 to R4 are independently H;
- C1-C10 alkyl or alkoxy, optionally substituted by halogen or ether oxygens;
- or C6-C20 aryl;
- and
- (ii) a photoactive component.
Dependencies are inferred from the claim text.