US 2005/0239659 A1 · Biaxially-textured film deposition for superconductor coated tapes

Abstract

Methods for depositing, at a very high deposition rate, a biaxially-textured film on a continuously moving metal tape substrate are disclosed. These methods comprise: depositing a film on the substrate with a deposition flux having an oblique incident angle of about 5° to about 80° from the substrate normal, while simultaneously bombarding the deposited film using an ion beam at an ion beam incident angle arranged along either a best ion texture direction of the film or along a second best ion texture direction of the film, thereby forming the biaxially-textured film, wherein a deposition flux incident plane is arranged parallel to a direction along which the biaxially-textured film has a fast in-plane growth rate. Superconducting articles comprising a substrate, a biaxially-textured film deposited on said substrate by said methods above; and a superconducting layer disposed on the biaxially-textured film are also disclosed.

Claims102

Dependent claims

A method for depositing a biaxially textured film on a substrate, comprising:

depositing a film on a substrate with a deposition flux at an oblique incident angle, while simultaneously bombarding said deposited film using an ion beam at an ion beam incident angle arranged along either a best ion texture direction (BITD) or a second best ion texture direction of said film, thereby forming a biaxially-textured film,
wherein a deposition flux incident plane is arranged parallel to a direction along which said biaxially-textured film has the fastest in-plane growth rate.

Dependencies are inferred from the claim text.

Biaxially-textured film deposition for superconductor coated tapes

Life of this patent

Biaxially-textured film deposition for superconductor coated tapes

Life of this patent

Abstract

Claims102