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US 2005/0238809 A1Published application
Device for deposition with chamber cleaner and method for cleaning the chamber
AssigneeHynix Semiconductor Inc.
InventorWoo-Seock Cheong
Life of this patent
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Abstract
A chamber cleaner includes a cleaner, which is sealed, a connector passing through a side of the cleaner, lamp assembly connected to the connector and uniformly arranged in an inside surface of the cleaner, a heat-source assembled in the lamp assembly and an exhausting unit having an entrance passing through a portion of the outside of the connector exposed to the cleaner, and an exit passing through a portion of the inside of the connector, which is extended to the outside of the exposed portion or a predetermined length.
Claims5
A method for cleaning a chamber, comprising the steps of:
- a) equipping a wafer and tube cleaner into a loading chamber;
- b) loading the wafer into a tube-type chamber vertically connected to the loading chamber;
- c) depositing a layer to the wafer;
- d) unloading the wafer to the loading chamber;
- e) loading the tube-type cleaner into the tube-type chamber and injecting a cleaning gas;
- and
- f) cleaning the tube-type chamber using the tube-type cleaner.
4 more elements
Dependencies are inferred from the claim text.