Chemically amplified positive resist composition and patterning process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsRyuji Koitabashi, Satoshi Watanabe, Youichi Ohsawa
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Abstract
A chemically amplified positive resist composition comprising a specific 2,4,6-triisopropylbenzenesulfonate compound as a photoacid generator, a polymer which changes its solubility in an alkaline developer under the action of acid, and a basic compound has a high sensitivity, a high contrast of dissolution of resist film, a high resolution, and good storage stability.
Claims10
A chemically amplified positive resist composition comprising at least one compound (1) selected from compounds having the formulae (1a), (1b), (1c), (1d) and (1e) shown below, said compound (1) being capable of generating an acid upon exposure to radiation or electron beams, a polymer which changes its solubility in an alkaline developer under the action of the acid, and a basic compound.
A compound having the formula (1d) or (1e).
Dependencies are inferred from the claim text.