Adjustable rinse flow in semiconductor processing
OwnerYao-Hwan Kao, Huei-Yi Changinventors
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Abstract
In the manufacture of semiconductor devices, a system and method for delivering gas at a predetermined rate of flow is disclosed, which includes: a flow controller having a diaphragm forming upstream and downstream chambers; a regulator for delivering gas to the upstream chamber of the flow controller at a substantially constant pressure, the controller having an outlet from the downstream chamber which is opened and closed by the diaphragm; an urging means for urging the diaphragm toward its closed position; and a valve for selectively adjusting the spring force to achieve the predetermined rate of flow without having to use a gas flow measurement device to monitor the flow rate.
Claims8
In the processing of semiconductor devices, a system for delivering gas at a predetermined rate of flow, comprising:
- a flow controller having a diaphragm forming upstream and downstream chambers;
- a regulator for delivering gas to the upstream chamber of the flow controller at a substantially constant pressure, said controller having an outlet from the downstream chamber which is opened and closed by the diaphragm;
- an urging means for urging the diaphragm toward its closed position;
- and a valve for selectively adjusting the spring force to achieve the predetermined rate of flow without having to use a gas flow measurement device to monitor the flow rate.
In the processing of semiconductor devices, a method for delivering gas at a predetermined rate of flow, comprising:
- regulating the delivery of gas to an upstream chamber of a flow controller at a substantially constant pressure, said controller having an outlet from a downstream chamber which is opened and closed by a diaphragm;
- and selectively adjusting spring force to achieve the predetermined rate of flow without having to use a gas flow measurement device to monitor the flow rate.
Dependencies are inferred from the claim text.