Method and apparatus for detecting topographical features of microelectronic substrates

An apparatus for detecting characteristics of a microelectronic substrate having a first surface with roughness features and a second surface facing opposite from the first surface and having raised conductive features, the apparatus comprising:

• a support member having a contact surface configured to contact the first surface of the microelectronic substrate, the support member being shaped to leave a first portion of the first surface exposed and a second portion of the second surface exposed when the microelectronic substrate contacts the support member;
• a roughness detector that includes a probe having a contact portion configured to contact the microelectronic substrate, the roughness detector being configured to detect a roughness of the microelectronic substrate based on measurements at a plurality of locations on the first surface of the microelectronic substrate;
• and
• an actuator coupled to at least one of the roughness detector and the support member to move at least one of the roughness detector and the support member relative to the other while the support member supports the microelectronic substrate.

An apparatus for detecting characteristics of a microelectronic substrate having a first surface with roughness features and a second surface facing opposite from the first surface and having raised conductive features, the apparatus comprising:

• a support member having a contact surface configured to contact the first surface of the microelectronic substrate, the support member being shaped to leave a first portion of the first surface and a second portion of the second surface exposed when the microelectronic substrate contacts the support member;
• a roughness detector that includes a radiation receiver positioned to receive radiation reflected from the first surface of the microelectronic substrate, the roughness detector being configured to detect a roughness of the microelectronic substrate based on measurements at a plurality of locations on the first surface of the microelectronic substrate;
• and
• an actuator coupled to at least one of the roughness detector and the support member to move at least one of the roughness detector and the support member relative to the other while the support member supports the microelectronic substrate.

An apparatus for detecting characteristics of a microelectronic substrate having a first surface with roughness features and a second surface facing opposite from the first surface and having raised conductive features, the apparatus comprising:

• a generally ring-shaped support member;
• a contact surface on the support member, the contact surface being configured to contact the first surface of the microelectronic substrate with a first portion of the first surface exposed and a second portion of the second surface exposed;
• a roughness detector positioned proximate to the support member;
• the roughness detector being and aligned with the first portion of the first surface of the microelectronic substrate when the microelectronic substrate is carried by the support member;
• the roughness detector including at least one of a contact probe configured to contact the first surface, and a remote detector configured to receive radiation reflected from the first surface;
• wherein at least one of the roughness detector and the support member is movable relative to the other while the microelectronic substrate is carried by the support member, and wherein the apparatus further comprises;
• a first feature detector positioned proximate to the second surface of the microelectronic substrate to detect at least one of a diameter, position, and surface characteristic of the raised conductive features when the microelectronic substrate is carried by the support member;
• and
• a second feature detector positioned proximate to the second surface of the microelectronic substrate to detect a height of the raised conductive features relative to the second surface when the microelectronic substrate is carried by the support member.

An apparatus for detecting characteristics of a microelectronic substrate having a first surface with roughness features and a second surface facing opposite from the first surface and having raised conductive features, the apparatus comprising:

• a support member having a contact surface configured to contact the first surface of the microelectronic substrate, the support member being shaped to leave a first portion of the first surface exposed and a second portion of the second surface exposed when the microelectronic substrate contacts the support member;
• a roughness detector that includes at least one of a probe having a contact portion configured to contact the microelectronic substrate, and a radiation receiver positioned to receive radiation reflected from the first surface of the microelectronic substrate, the roughness detector being configured to detect a roughness of the microelectronic substrate based on measurements at a plurality of locations on the first surface of the microelectronic substrate;
• and
• an actuator coupled to at least one of the roughness detector and the support member to move at least one of the roughness detector and the support member relative to the other while the support member supports the microelectronic substrate.