Chemical vapor deposition (CVD) apparatus usable in the manufacture of superconducting conductors

A precursor supply system usable with a reactor of a chemical vapor deposition (CVD) apparatus in combination with a substrate heater, precursor injector and usable in the manufacture of superconducting conductor on an elongate substrate, the precursor supply system comprising:

• a) at least one precursor source;
• b) at least one a delivery mechanism including at least one assist vehicle;
• c) at least one vaporizer for vaporizing a precursor provided by at least the at least one precursor source;
• and
• d) at least one vehicle for transporting at least the vaporized precursor from the precursor supply to the precursor injector of the CVD apparatus.

A chemical vapor deposition (CVD) apparatus usable in the manufacture of superconducting conductor on an elongate substrate, the CVD apparatus comprising:

• a) a reactor;
• b) at least one substrate heater;
• and
• c) at least one precursor supply system;
• i) at least one precursor source,
• ii) at least one a delivery mechanism including at least one assist vehicle;
• ii) at least one vaporizer for vaporizing a precursor provided by at least the at least one precursor source;
• and
• vi) at least one vehicle for transporting at least the vaporized precursor from the precursor supply to the precursor injector of the CVD apparatus;
• d) at least one precursor injector;
• and
• e) at least one gas composition monitor.

A method for manufacturing a high temperature superconducting conductor, said method comprising the steps of:

• a) providing at least a portion of an elongate substrate to a reactor;
• b) heating the at least a portion of the elongate substrate to a temperature so as to permit the formation of one of a predecessor to a superconducting material and a superconducting material on the at least a portion of the substrate;
• c) providing at least one precursor to the reactor so as to permit the formation one of a predecessor to a superconducting material and a superconducting material on the at least a portion of the substrate;
• and
• d) monitoring at least one aspect of a composition of a gas in the reactor so as to control the formation of the one of a predecessor to a superconducting material and a superconducting material on the at least a portion of the substrate.

A method for manufacturing a high temperature superconducting conductor using a reactor of a chemical vapor deposition (CVD) apparatus in combination with a substrate heater, and precursor injector, the method comprising the steps of:

• a) providing at least one precursor to a vaporizer using at least one assist vehicle;
• b) vaporizing the precursor;
• and
• c) transporting the at least one vaporized precursor to the reactor so as to permit a formation of formation of the one of a predecessor to a superconducting material and a superconducting material.

A method for manufacturing a high temperature superconducting conductor, the method comprising the steps of:

• a) providing at least a portion of at least one substrate heater to a reactor;
• b) heating the at least a portion of at least one substrate heater to a temperature sufficient to permit to permit a formation of formation of the one of a predecessor to a superconducting material and a superconducting material;
• and
• c) providing at least one precursor to a vaporizer using at least one assist vehicle;
• d) vaporizing the precursor;
• e) transporting the at least one vaporized precursor to the reactor so as to permit a formation of formation of the one of a predecessor to a superconducting material and a superconducting material on the at least a portion of the substrate;
• and
• f) monitoring at least one aspect of a composition of a gas in the reactor so as to control the formation of the one of a predecessor to a superconducting material and a superconducting material on the at least a portion of the substrate.