Process for preparing fluorine-containing polymer and photoresist composition
AssigneeDaikin Industries, Ltd.
InventorsTakayuki Araki, Takuji Ishikawa, Meiten Koh, Minoru Toriumi
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AssigneeDaikin Industries, Ltd.
InventorsTakayuki Araki, Takuji Ishikawa, Meiten Koh, Minoru Toriumi
Estimating the term…
There is provided a process for preparing a fluorine-containing polymer for resist which is excellent in transparency in a vacuum ultraviolet region, comprises a structural unit derived from a fluorine-containing ethylenic monomer and/or a structural unit derived from a monomer which can provide an aliphatic ring structure in the polymer trunk chain and may have a fluorine atom, and has an acid-reactive group Y1 reacting with an acid or a group Y2 which can be converted to the acid-reactive group Y1, in which the fluorine-containing ethylenic monomer and/or the monomer which can provide an aliphatic ring structure in the polymer trunk chain are subjected to radical polymerization by using an organic peroxide represented by the formula (1): wherein R50 and R51 are the same or different and each is a hydrocarbon group having 1 to 30 carbon atoms which may have ether bond (an atom at an end of bond is not oxygen atom); p1 and p2 are the same or different and each is 0 or 1; p3 is 1 or 2, and also there is provided a photoresist composition comprising the obtained polymer. The fluorine-containing polymer is excellent in transparency in a vacuum ultraviolet region, and can form an ultra fine pattern as a polymer for a photoresist, particularly for a F2 resist.
A process for preparing a fluorine-containing polymer having a structural unit (M1) derived from a monomer (m1) which provides an aliphatic ring structure in the polymer trunk chain and may have fluorine atom, in which said monomer (m1) being capable of providing an aliphatic ring structure in the polymer trunk chain is subjected to radical polymerization by using an organic peroxide having a structural unit represented by the formula (1 -1):
A process for preparing a fluorine-containing polymer for resist which is excellent in transparency in a vacuum ultraviolet region, comprises a structural unit (M2) derived from a fluorine-containing ethylenic monomer (m2) having 2 or 3 carbon atoms and at least one fluorine atom and/or a structural unit (M3) derived from a monomer (m3) which can provide an aliphatic ring structure in the polymer trunk chain and may have fluorine atom, and contains an acid-reactive group Y1 reacting with an acid or a group Y2 which can be converted to the acid-reactive group Y1, said process is characterized in that the fluorine-containing ethylenic monomer (m2) and/or the monomer (m3) which can provide an aliphatic ring structure in the polymer trunk chain are subjected to radical polymerization by using an organic peroxide represented by the formula (1):
Dependencies are inferred from the claim text.