Vacuum sputtering cathode
AssigneeTecmachine
InventorsLionel Labalme, Michel Aulagner
Life of this patent
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Abstract
A vacuum sputtering cathode includes a target support having a cooler. The cathode includes a support base on which a frame is disposed. The frame defines at least one cavity for the circulation of a coolant. A membrane is disposed on top of the frame and the base, frame and membrane are assembled at the periphery of the target.
Claims12
Cathode for vacuum sputtering having a support for a target of the cathode, the support comprises a cooler having a support base on which a frame is superposed, the frame delimiting at least one gap for circulation of a cooling fluid, the frame having a membrane superposed thereon, and the base, the frame and the membrane being joined together around a periphery of the target.
Dependencies are inferred from the claim text.