Installation for the vacuum treatment in particular of substrates
AssigneeTecmachine
InventorsGilles Fourezon, Jean-Marc Poirson
Life of this patent
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Abstract
Installation for vacuum treatment, particularly of substrates, includes several identical independent and aligned modules. Each module is provided with a vacuum treatment chamber and a transfer chamber having a mechanism for transferring a substrate within one of the different chambers or from one chamber to another, the second chamber being located downstream or upstream from, directly next to, or separated by at least one module from the first chamber. A substrate can be transferred into one chamber in order to undergo a treatment while another substrate is placed in a different chamber for a specific treatment.
Claims9
An installation for vacuum treatment, particularly of substrates, comprising a plurality of identical independent and aligned modules, each module comprising a vacuum treatment chamber and a transfer chamber with means of transferring a substrate within one of the different chambers or from one chamber to another located downstream or upstream, directly next to it or separated by at least one module, in such a way that, while one substrate is in a chamber for a specific treatment, another substrate can be transferred to another chamber to undergo another treatment.
Dependencies are inferred from the claim text.