Waveguide structure and method of manufacturing the same

A waveguides structure comprising a waveguide formed on a substrate, having a lower cladding layer made of SiO2 glass and on top of this a core made of Si, wherein the entire waveguide, including said core, is covered by SiO2 glass or a polymer material having a refractive index approximately equal to that of SiO2 glass.

A waveguide structure comprising a waveguide formed on a substrate, having a lower cladding layer made of SiO2 glass and on top of this a core made of Si, wherein the entire waveguide, including said core, is doubly covered by a layer made of SiO2 glass and on top of this, further by a polymer material having a refractive index approximately equal to that of SiO2 glass but having a refractive index temperature coefficient opposite in sign to that of SiO2 glass.

A method of manufacturing a waveguide structure of a waveguide formed on a substrate, having a lower cladding layer made of SiO2 glass and on top of this a core made of Si, the entire waveguide, including said core, being covered by SiO2 glass or a polymer material having a refractive index approximately equal to that of SiO2 glass, wherein a thickness of said core is thinned by annealing in a high temperature atmosphere after a formation of said waveguide structure to adjust the confinement strength of light.

A method of manufacturing a waveguide structure having a cross-sectional structure in which a core made of Si is in the center and it is surrounded by a peripheral material, which is either SiO2, or a polymer material, wherein a thickness of said core made of Si is thinned by thermal oxidation in a high temperature steam atmosphere to adjust the confinement strength of light.

A method of manufacturing a waveguide structure of a waveguide formed on a substrate, having a lower cladding layer made of SiO2 glass and on top of this a core made of Si, the entire waveguide, including said core, being covered by SiO2 glass or a polymer material having a refractive index approximately equal to that of SiO2 glass, wherein a thickness of said core made of Si is thinned by thermal oxidation in a high temperature steam atmosphere to adjust a confinement strength of light.

A method of manufacturing a waveguide structure of a waveguide formed on a substrate, having a lower cladding layer made of SiO2 glass and on top of this a core made of Si, the entire waveguide, including said core, being doubly covered by SiO2 glass and on top of this further by a polymer material having a refractive index approximately equal to that of SiO2 glass but having a temperature coefficient of the refractive index of an opposite sign to that of the SiO2 glass, wherein a thickness of said core made of Si is thinned by thermal oxidation in a high temperature steam atmosphere to adjust the confinement strength of light.