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AssigneesUniversity of Texas System Board of Regents, Molecular Imprints, Inc.
InventorsIan McMackin, Nicholas Stacey, Daniel Babbs, Duane Voth, Michael Watts, Van Truskett, Frank Xu, Ronald Voisin, Pankaj Lad
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The present invention is directed toward a method for reducing pattern distortions in imprinting layers by reducing gas pockets present in a layer of viscous liquid deposited on a substrate. To that end, the method includes varying a transport of the gases disposed proximate to the viscous liquid. Specifically, the atmosphere proximate to the substrate wherein a pattern is to be recorded is saturated with gases that are either highly soluble, highly diffusive, or both with respect to the viscous liquid being deposited. Additionally, or in lieu of saturating the atmosphere, the pressure of the atmosphere may be reduced.
A method for reducing gases present in a layer of viscous liquid deposited on a substrate, said method comprising:
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A method for reducing gases present in a layer of viscous liquid deposited on a substrate, said method comprising:
A method for reducing gases present in a layer of viscous liquid deposited on a substrate, said method comprising:
A method for reducing gases present in a layer of viscous liquid deposited on a substrate, said method comprising:
The method as recited in claim 25 wherein introducing further includes introducing said fluid selected from a set of fluids consisting of carbon dioxide and helium.
Dependencies are inferred from the claim text.