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US 2005/0037597 A1Published application
Semiconductor processing system and method
OwnerTue Nguyen, Tai Nguyen +1inventors
InventorsTue Nguyen, Tai Nguyen, Craig Bercaw
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Abstract
Systems and methods are disclosed to perform semiconductor processing with a process chamber; a flash lamp adapted to be repetitively triggered; and a controller coupled to the control input of the flash lamp to trigger the flash lamp. The system can deploy a solid state plasma source in parallel with the flash lamp in wafer processing.
Claims20
A method to deposit a film in a processing chamber, comprising:
- (a) introducing a first plurality of precursors to deposit a thin layer;
- (b) either
- triggering a flash lamp to generate thermal energy to modify the deposited layer;
- or
- triggering a plasma source to generate a plasma energy to modify the deposited layer;
- or
- triggering a flash lamp to generate thermal energy and triggering a plasma source to generate a plasma energy to modify the deposited layer.
4 more elements
A method to deposit a film in a processing chamber, comprising:
- (a) deposit a thin layer using a plasma assisted process;
- and
- (b) triggering a flash lamp to generate thermal energy to modify the deposited layer.
A method to deposit a film in a processing chamber, comprising:
- (a) deposit a thin layer using a flash lamp assisted process;
- and
- (b) triggering a plasma source to generate plasma energy to modify the deposited layer.
Dependencies are inferred from the claim text.