Low polydispersity resin, and preparation thereof
OwnerTing-Yu Lee, Choa-Ying Yu +4inventors
InventorsTing-Yu Lee, Choa-Ying Yu, Meei-Yu Hsu, Shian-Jy Wang, Ching Ting, Kuo-Chen Shih
Life of this patent
Estimating the term…
Abstract
A resin with low polydispersity index and a process for preparing the same. The process includes polymerizing at least one monomer with an initiator and a chain transfer reagent, wherein the monomer is an acrylate monomer having at least one ethylenically unsaturated bonds or norbornene derivatives. Furthermore, a photoresist composition containing the resin composition according to the present invention can increase pattern resolution in lithography process.
Claims31
A resin with lowered polydispersity index, comprising the reaction product of the following reactants:
- at least two different acrylate monomers;
- at least one initiator;
- and
- at least one chain transfer reagent,
- wherein the reaction product has a polydispersity index of 1.5 or less.
A resin with lowered polydispersity index, comprising the reaction product of the following reactants:
- at least one norbornene monomer in a ratio from 1 ppm to 100 wt %;
- at least one acrylate monomer, in a ratio from 0 wt % to 99.99999 wt %, based on the weight of at least one norbornene monomer and at least one acrylate monomer;
- at least one initiator;
- and
- at least one chain transfer reagent,
- wherein the reaction product has a polydispersity index of 1.5 or less.
A preparation of a resin with lowered PDI, comprising:
- reacting at least one reactive monomer, at least one initiator, and at least one chain transfer reagent undergoing polymerization to obtain a resin with lowered PDI,
- wherein the reactive monomer comprises acrylate monomer, norbornene monomer, or combinations thereof.
Dependencies are inferred from the claim text.