Method and apparatus for electron density measurement and verifying process status
AssigneeTokyo Electron Limited
InventorEric Strang
Life of this patent
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Abstract
An equipment status monitoring system and method of operating thereof is described. The equipment status monitoring system includes at least one microwave mirror in a plasma processing chamber forming a multi-modal resonator. A power source is coupled to a mirror and configured to produce an excitation signal extending along an axis generally perpendicular to a substrate. A detector is coupled to a mirror and configured to measure an excitation signal. A control system is connected to the detector that compares a measured excitation signal to a normal excitation signal in order to determine a status of the material processing equipment.
Claims36
An equipment status monitoring systemcomprising:
- a plasma chamber;
- at least one multi-modal resonator, wherein said multi-modal resonator comprises a first reflecting surface, said first reflecting surface arranged opposite a second reflecting surface, wherein one of said first and second reflecting surfaces are adapted to be provided within said plasma chamber;
- a power source coupled to at least one of said first reflecting surface and second reflecting surface of said at least one multi-modal resonator, said power source being configured to produce an excitation signal extending along an axis generally perpendicular to a substrate;
- a detector coupled to said at least one multi-modal resonator, said detector being configured to measure said excitation signal;
- and
- a control system connected to said detector and configured to provide a comparison of at least one measured excitation signal with a normal excitation signal corresponding to a normal status, wherein said comparison determines an equipment status.
A method of monitoring a status of a material processing system, said material processing system including a chamber, at least one multi-modal resonator comprising a first reflecting surface, said first reflecting surface arranged opposite a second reflecting surface, wherein one of said first and second reflecting surfaces are adapted to be provided within said chamber, a power source coupled to said multi-modal resonator, and a detector coupled to said multi-modal resonator, said method comprising the steps of:
- sweeping an output frequency of said power source to produce said excitation signal extending along an axis generally perpendicular to a substrate;
- recording said excitation signal from said multi-modal resonator;
- comparing said excitation signal with a normal excitation signal, wherein said normal excitation signal corresponds to a normal status of said material processing system;
- and
- determining said status of said material processing system from said comparing.
An equipment status monitoring system, said equipment status monitoring system comprising:
- a plasma chamber;
- plural multi-modal resonators configured to produce excitation signals, wherein each of said plural multi-modal resonators comprises a first reflecting surface, said first reflecting surface arranged opposite a second reflecting surface, wherein at least one of said first and second reflecting surfaces are adapted to be provided within said plasma chamber, a power source coupled to at least one of said plural multi-modal resonators, said plural multi-modal resonators being configured to produce excitation signals extending along an axis generally perpendicular to a substrate, a detector coupled to each of said plural multi-modal resonators;
- and
- a control system connected to each detector and configured to provide a measurement of said excitation signals corresponding to a normal status.
An equipment status monitoring system, said equipment status monitoring system comprising:
- plural multi-modal resonators configured to produce excitation signals, wherein each of said plural multi-modal resonators comprises a first reflecting surface, said first reflecting surface arranged opposite a second reflecting surface, a power source coupled to at least one of said plural multi-modal resonators, said plural multi-modal resonators being configured to produce excitation signals extending along an axis generally perpendicular to a substrate, a detector coupled to each of said plural multi-modal resonators;
- and
- a control system connected to each detector and configured to provide a measurement of said excitation signals corresponding to a normal status.
An equipment status monitoring system, said equipment status monitoring system comprising:
- at least one multi-modal resonator, wherein said multi-modal resonator comprises a first reflecting surface, said first reflecting surface arranged opposite a second reflecting surface;
- a power source coupled to at least one of said first reflecting surface and second reflecting surface of said at least one multi-modal resonator, said power source being configured to produce an excitation signal extending along an axis generally perpendicular to a substrate;
- a detector coupled to said at least one multi-modal resonator, said detector being configured to measure said excitation signal;
- and
- a control system connected to said detector and configured to provide a comparison of at least one measured excitation signal with a normal excitation signal corresponding to a normal status, wherein said comparison determines an equipment status.
Dependencies are inferred from the claim text.