Uniform pressing apparatus
AssigneeIndustrial Technology Research Institute
InventorsYong-Chen Chung, Chia-Hung Lin, Chia-Chun Hsu, Chuan-Feng Chen, Wen-Hung Feng, Ming-Chi Chen
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AssigneeIndustrial Technology Research Institute
InventorsYong-Chen Chung, Chia-Hung Lin, Chia-Chun Hsu, Chuan-Feng Chen, Wen-Hung Feng, Ming-Chi Chen
Estimating the term…
A uniform pressing apparatus used in nanoimprint lithographic process is proposed, including a housing having a first flange; a first carrier unit for carrying an imprint mold and having at least one second flange freely attaches to the first flange; a second carrier unit for carrying a substrate; at least one uniform pressing unit mounted on a imprint force transmission path; and a power source driving at least one of the housing and the second carrier unit to allow a contact to be formed between the mold and the moldable layer. Therefore, the nanoimprint lithographic process is achieved with good parallelism between the substrate and the mold and with uniform pressure distribution.
A uniform pressing apparatus applicable to a nanoimprint lithographic process, comprising:
A uniform pressing apparatus applicable to a nanoimprint lithographic process, comprising:
Dependencies are inferred from the claim text.