Method of using a Manhattan layout to realize non-Manhattan shaped optical structures

A method for generating an integrated circuit layout of at least one non-Manhattan optical element and at least one Manhattan electronic element, the method comprising the steps of:

• simulating a set of predetermined optical functions to generate a physical layout of at least one non-Manhattan optical element;
• converting the physical layout of the at least one non-Manhattan optical element into a layout compatible with a Manhattan grid system, the converting step requiring the steps of:
• a) determining the minimum grid resolution of a specific Manhattan layout and mask making system;
• b) defining a minimum spacing between adjacent vertices of a polygon as the distance between a pair of selected grid points;
• c) superimposing a non-Manhattan element over the Manhattan grid system;
• d) fitting a plurality of polygons within the defined space of the non-Manhattan element by locating at least one vertex of each polygon on the periphery of the non-Manhattan element;
• simulating a set of predetermined electrical functions to generate a physical layout of at least one Manhattan electronic element;
• providing the Manhattan layout of the at least one electronic element and the converted Manhattan layout of the at least one optical element as inputs to a mask making system;
• and
• generating a mask including the layout of both the optical and electronic elements on a Manhattan grid system.

A system for defining an integrated circuit layout for non-Manhattan elements using a Manhattan grid system, the system including a processor capable of performing the operations of

• a) determining the minimum grid resolution of a specific Manhattan layout and mask making system;
• b) defining a minimum spacing between adjacent vertices of a polygon as the distance between a pair of selected grid points;
• c) superimposing a non-Manhattan element over the Manhattan grid system;
• d) fitting a plurality of polygons within the defined space of the non-Manhattan element by locating at least one vertex of each polygon on the periphery of the non-Manhattan element.

A mask layout software tool comprising:

• an optical simulator for developing a physical layout of at least one optical component having a non-Manhattan geometry;
• a layout conversion module for converting the physical layout of the at least one optical component having a non-Manhattan geometry into a layout for use with a Manhattan grid system, the layout conversion module comprising a processor capable of performing the operations of:
• a) determining the minimum grid resolution of a specific Manhattan layout and mask making system;
• b) defining a minimum spacing between adjacent vertices of a polygon as the distance between a pair of selected grid points;
• c) superimposing a non-Manhattan element over the Manhattan grid system;
• d) fitting a plurality of polygons within the defined space of the non-Manhattan element by locating at least one vertex of each polygon on the periphery of the non-Manhattan element;
• an electronic simulator for developing a physical layout of at least one electronic component having a Manhattan;
• and
• a mask layout module, coupled to the electronic simulator and the output of the layout conversion module for generating a layout of both the optical and electrical components.