Saponified, alkoxyl group-containing ethylene-vinyl acetate copolymer and its processed products
AssigneeKuraray Co.Ltd.
InventorsKazuyori Yoshimi, Osamu Kazeto, Masako Katayama
Life of this patent
Estimating the term…
Loading patent…
AssigneeKuraray Co.Ltd.
InventorsKazuyori Yoshimi, Osamu Kazeto, Masako Katayama
Estimating the term…
A saponified ethylene-vinyl acetate resin, containing from 0.1 to 3000 ppm of a compound having a molecular weight of at most 1000 and having at least one conjugated double bond, an alkoxy group content of from 0.0005 to 1 mol %, an ethylene content of from 5 to 60 mol %, and a degree of saponification of at least 85 mol % has good melt extrusion stability, drawdown resistance, interlayer adhesion and gas barrier properties, and products made therefrom have good surface smoothness. The saponified ethylene-vinyl acetate resin may be produced by polymerizing a mixture of ethylene and vinyl acetate in the presence of a polymerization initiator having an alkoxy group, thereby producing an ethylene-vinyl acetate copolymer, adding a compound having a molecular weight of at most 1000 and at least one conjugated double bond to the ethylene-vinyl acetate copolymer, then saponifying the ethylene-vinyl acetate copolymer, thereby forming a saponified ethylene-vinyl acetate copolymer.
A resin composition, which comprises a saponified ethylene-vinyl acetate resin and from 0.1 to 3000 ppm, based on the total amount of the saponified ethylene-vinyl acetate resin, of a compound having a molecular weight of at most 1000 and having at least one conjugated double bond, wherein the saponified ethylene vinyl acetate resin has a methoxy group content of from 0.0005 to 1 mol % based on the total moles of monomer units in the resin, an ethylene content of from 5 to 60 mol % based on the total moles of monomer units in the resin, and a degree of saponification of at least 85 mol % based on the number of moles of vinyl acetate monomer units in the resin.
(Canceled).
Dependencies are inferred from the claim text.