Cleaning sheet, carrying member with a cleaning function and method of cleaning substrate processing equipment

A carrying member with a cleaning function, comprising a carrying member and a cleaning layer provided on at least one side of the carrying member, wherein each of the relative intensities of the fragment ions of CH3Si+, C3H9Si+, C5H15Si2O+, C5H15Si3O3+, C7H21Si3O2+, CH3SiO−, CH3SiO2− and Si+ in the cleaning layer is 0.1 or less according to time-of-flight secondary ion mass spectrometry, relative to C2H3+ in the case of positive ion or O− in the case of negative ion.

A carrying member with a cleaning function, comprising a carrying member and a cleaning layer provided on at least one side of the carrying member, wherein the time required until the degree of vacuum in a chamber which has been temporarily reduced from 3×10−10 torr when the carrying member is put therein at a temperature of 50° C. is returned to 1×10−9 torr is 100 minutes or less after putting the carrying member in the chamber.