Objective, particularly a projection objective for use in semiconductor lithography
AssigneeCarl Zeiss SMT GmbH
InventorsAlexander Kohl, Hubert Holderer, Werner Lang, Hartmut Brandenburg
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Abstract
The invention relates to an objective, particularly a projection objective for use in semiconductor lithography, comprising optical elements such as lenses (16) and mirrors (11a). According to the invention, at least a portion of the optical elements (16, 11a) is provided with a reflective surface outside of the optically active area serving as the reference surface (12) for adjusting the optical element inside the objective (8).
Claims11
An objective having optical elements such as lenses and mirrors, characterized in that at least some of the optical elements (16, 11a) are provided in each case with a reflecting surface outside the optically active region, as a reference surface (12) for adjusting the optical element inside the objective or inside a subassembly of an objective.
An objective having optical elements such as lenses and mirrors that are supported iii mounts, characterized in that at least some of the mounts (17) of the optical elements (16, 11a) are provided in each case with a reflecting surface (12) for adjusting the optical element inside the objective or inside a subassembly of an objective.
An optical element, particularly a lens or mirror, characterized by a reflecting surface (12) outside the optically active region, the reflecting surface (12) being located on the optical element.
An optical element, particularly a lens or mirror, having a mount, characterized by a reflecting surface (12) on the mount (17).
Dependencies are inferred from the claim text.