US 2004/0201832 A1 · Pattern writing apparatus and pattern writing method

Abstract

A pattern writing apparatus for writing a pattern on a photosensitive material comprises a head provided with a DMD having a micromirror group which modulates reflected light, a stage holding a substrate, and mechanisms for moving the head and the stage relative to each other. In the pattern writing apparatus, for pattern writing, an irradiation region group on a substrate, which corresponds to the micromirror group of the DMD, is scanned in a main scanning direction that is angled relative to the direction of arrangement of the irradiation region group. The irradiation region group is also intermittently moved in the sub-scanning direction by a distance shorter than the width of the irradiation region group in the sub-scanning direction, for pattern writing of the entire substrate. Thus, even with slight changes in an intermittent travel distance (A) of the irradiation region group, light is suitably applied to a region between strips (71, 72), whereby high-precision high-speed pattern writing is achieved.

Claims20

Dependent claims

A pattern writing apparatus for writing a pattern by light irradiation on a photosensitive material, comprising:

a spatial light modulator applying a modulated light beam to an irradiation region group arrayed in a lattice arrangement on a photosensitive material;
a main scanning mechanism for scanning said irradiation region group over a photosensitive material in a main scanning direction that is tilted relative to a direction of arrangement of said irradiation region group, so that a plurality of irradiation regions pass over each of writing regions included in a writing region group fixed on said photosensitive material;
a sub-scanning mechanism for intermittently moving said irradiation region group relative to a photosensitive material in a sub-scanning direction orthogonal to said main scanning direction by a distance shorter than a width of said irradiation region group in said sub-scanning direction;
and
a controller controlling said spatial light modulator in synchronization with main scanning of said irradiation region group.

2 more elements

Dependencies are inferred from the claim text.

Pattern writing apparatus and pattern writing method

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Pattern writing apparatus and pattern writing method

Life of this patent

Abstract

Claims20