Mother plate for deep lines pattern impression and manufacturing thereof
AssigneeKlaser Technology Inc.
InventorsHsing-Mao Wang, Min-Yi Hsu
Life of this patent
Estimating the term…
Loading patent…
AssigneeKlaser Technology Inc.
InventorsHsing-Mao Wang, Min-Yi Hsu
Estimating the term…
The UV resin used in the present invention is spread on the surface of a mother mold with lines. Illuminate UV light to harden the UV resin after it penetrated the lines completely. Thereby, to the depth and the shape of the lines of a pattern with deep lines, a complete duplication can be obtained in order to solve the deficiency of mother plate manufacturing technique at present. A seam between two mother plates is more smooth and has less influence on the lines structures at two sides thereof when a plurality of mother plate units are assembled to a big mother plate. The present invention provides an easy and novel plates assembly technique that gives consideration to both the lines in succeeding electroplating and impression procedures and required flatness for seams. Thereby, a seam between two mother plates is more smooth and has less influence on the lines structures at two sides thereof when a plurality of mother plate units are assembled to a big mother plate.
A manufacturing method for a impression mother plate with pattern lines, mainly comprising the following steps:
a method for assembling impression mother plates with pattern lines, comprising the follow steps:
A method for assembling impression mother plates with pattern lines, comprising the follow steps:
An impression mother plate with pattern lines, comprising at least one sheet of mother plate unit, said mother plate comprising a transparent plate combined with a UV resin film, wherein said UV resin film has pattern lines.
Dependencies are inferred from the claim text.