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US 2004/0201042 A1Published application
Structure having pores and its manufacturing method
AssigneeCanon Kabushiki Kaisha
InventorsToru Den, Nobuhiro Yasui, Tatsuya Saito
Life of this patent
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Abstract
A structure having pores includes a first layer containing alumina, a second layer that includes at least one of Ti, Zr, Hf, Nb, Ta, Mo, W and Si, and a third layer with electrical conductivity, in this order, wherein the first and second layers have pores.
Claims13
-17. (Cancelled)
A method for manufacturing a structure having pores, the method comprising the step of:
- preparing a first layer containing alumina, a second layer that includes at least one of Ti, Zr, Hf, Nb, Ta, Mo, W and Si, and third layer with electrical conductivity, in the order;
- and
- anodically oxidizing the first layer and forming first pores in the first layer;
- and
- forming second pores in the second layer.
2 more elements
Dependencies are inferred from the claim text.