Method of processing quartz member for plasma processing device, quartz member for plasma processing device, and plasma processing device having quartz member for plasma processing device mounted thereon

A method for surface-treating a quartz member, installed in a processing chamber for performing a processing on an object to be processed by a plasma excited therein, and having an exposed surface being exposed inside the processing chamber,

• wherein the exposed surface of the quartz member is processed by sequentially performing thereon a fire polishing, a surface processing by using abrasive particles and a wet etching processing by using an acid.

A quartz member, installed in a processing chamber for performing a processing on an object to be processed by a plasma excited therein, and having an exposed surface being exposed inside the processing chamber,

• wherein the exposed surface of the quartz member is processed by sequentially performing thereon a surface processing by using abrasive particles of a first particle diameter and a wet etching by using an acid.

A quartz member, installed in a processing chamber for performing a processing on an object to be processed by a plasma excited therein, and having an exposed surface being exposed inside the processing chamber,

• wherein the exposed surface of the quartz member is processed by sequentially performing thereon a fire polishing, a surface processing by using abrasive particles and a wet etching processing by using an acid.